Musterbildungsvorrichtung, gegenüber aktinischer strahlen oder strahlung empfindliche harzzusammensetzung und resistfilm

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

Procédé de formation de motifs, composition de résine sensible aux rayons actiniques ou aux radiations et film de réserve

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    See also references of WO 2011083872A1
    WALTER LUTZ ET AL: "Darstellung und Reaktionen des Trifluormethylisocyanats", CHEMISCHE BERICHTE, vol. 112, no. 6, 1 June 1979 (1979-06-01), pages 2158 - 2166, XP055077846, ISSN: 0009-2940, DOI: 10.1002/cber.19791120623

Cited By (0)

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